تخميل

(تم التحويل من طبقة التخميل)
For the concept in nonlinear control, see Feedback passivation. For the concept in spacecraft, see Passivation (spacecraft).

التخميل Passivation أو كبت الفاعلية هي عملية تهدف إلى جعل مادة ما خاملة بالنسبة لمادة أخرى وذلك بشكل مسبق لاستخدام المادتين معاً. على سبيل المثال قبل تخزين سائل پيروكسيد الهيدروجين H2O2 في حاويات من الألمنيوم يمكن جعل هذه الحاوية خاملة بالنسبة للسائل المراد تخزينه عبر معالجتها بمحلول مخفف من حامض النيتريك HNO3 والبيروكسيد بالتناوب مع الماء المقطر. يتأكسد حمض الآزوت مع البيروكسيد ويؤدي إلى انحلال الشوائب التي قد توجد على سطوح التماس في الحاويات، بينما يقوم الماء المقطر بغسل وتنظيف السطوح من الحامض والشوائب المتأكسدة.[1]

وفي سياق الصدأ، فإن التخميل هو التكوين الفوري لسطح رقيق صلب غير متفاعل يمنع المزيد من الصدأ. هذه الطبقة عادة ما تكون أكسيد أو نيتريد سمكها بضعة ذرات. Passivation of silicon is used during fabrication of microelectronic devices.[2] In electrochemical treatment of water, passivation reduces the effectiveness of the treatment by increasing the circuit resistance, and active measures are typically used to overcome this effect, the most common being polarity reversal, which results in limited rejection of the fouling layer.

When exposed to air, many metals naturally form a hard, relatively inert surface layer, usually an oxide (termed the "native oxide layer") or a nitride, that serves as a passivation layer. In the case of silver, the dark tarnish is a passivation layer of silver sulfide formed from reaction with environmental hydrogen sulfide. (In contrast, metals such as iron oxidize readily to form a rough porous coating of rust that adheres loosely and sloughs off readily, allowing further oxidation.) The passivation layer of oxide markedly slows further oxidation and corrosion in room-temperature air for aluminium, beryllium, chromium, zinc, titanium, and silicon (a metalloid). The inert surface layer formed by reaction with air has a thickness of about 1.5 nm for silicon, 1–10 nm for beryllium, and 1 nm initially for titanium, growing to 25 nm after several years. Similarly, for aluminium, it grows to about 5 nm after several years.[3][4][5]

In the context of the semiconductor device fabrication, such as silicon MOSFET transistors and solar cells, surface passivation refers not only to reducing the chemical reactivity of the surface but also to eliminating the dangling bonds and other defects that form electronic surface states, which impair performance of the devices. Surface passivation of silicon usually consists of high-temperature thermal oxidation.

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آليات التخميل

Pourbaix diagram of iron.[6]

There has been much interest in determining the mechanisms that govern the increase of thickness of the oxide layer over time. Some of the important factors are the volume of oxide relative to the volume of the parent metal, the mechanism of oxygen diffusion through the metal oxide to the parent metal, and the relative chemical potential of the oxide. Boundaries between micro grains, if the oxide layer is crystalline, form an important pathway for oxygen to reach the unoxidized metal below. For this reason, vitreous oxide coatings – which lack grain boundaries – can retard oxidation.[7] The conditions necessary, but not sufficient, for passivation are recorded in Pourbaix diagrams. Some corrosion inhibitors help the formation of a passivation layer on the surface of the metals to which they are applied. Some compounds, dissolved in solutions (chromates, molybdates) form non-reactive and low solubility films on metal surfaces.


التاريخ

الاكتشاف

In the mid 1800s, Christian Friedrich Schönbein discovered that when a piece of iron is placed in dilute nitric acid, it will dissolve and produce hydrogen, but if the iron is placed in concentrated nitric acid and then returned to the dilute nitric acid, little or no reaction will take place. Schönbein named the first state the active condition and the second the passive condition. If passive iron is touched by active iron, it becomes active again. In 1920, Ralph S. Lillie measured the effect of an active piece of iron touching a passive iron wire and found that "a wave of activation sweeps rapidly (at some hundred centimeters a second) over its whole length".[8][9]

تخميل السطح

The surface passivation process, also known as the Atalla passivation technique,[10] was developed by Mohamed M. Atalla at Bell Telephone Laboratories (BTL) in the late 1950s.[11][12] In 1955, Carl Frosch and Lincoln Derick at Bell Telephone Laboratories (BTL) accidentally discovered that silicon dioxide (SiO2) could be grown on silicon. They showed that oxide layer prevented certain dopants into the silicon wafer, while allowing for others, thus discovering the passivating effect of oxidation on the semiconductor surface.[13] In the late 1950s, Atalla further discovered that the formation of a thermally grown SiO2 layer greatly reduced the concentration of electronic states at the silicon surface,[12] and discovered the important quality of SiO2 films to preserve the electrical characteristics of p–n junctions and prevent these electrical characteristics from deteriorating by the gaseous ambient environment.[14] He found that silicon oxide layers could be used to electrically stabilize silicon surfaces.[15] J.R. Ligenza and W.G. Spitzer, who studied the mechanism of thermally grown oxides, managed to fabricate a high quality Si/SiO2 stack, with Atalla and Kahng making use of their findings.[16][17][18] Atalla developed the surface passivation process, a new method of semiconductor device fabrication that involves coating a silicon wafer with an insulating layer of silicon oxide so that electricity could reliably penetrate to the conducting silicon below. By growing a layer of silicon dioxide on top of a silicon wafer, Atalla was able to overcome the surface states that prevented electricity from reaching the semiconducting layer.[11][19] For the surface passivation process, he developed the method of thermal oxidation, which was a breakthrough in silicon semiconductor technology.[20]

Before the development of integrated circuit chips, discrete diodes and transistors exhibited relatively high reverse-bias junction leakages and low breakdown voltage, caused by the large density of traps at the surface of single crystal silicon. Atalla's surface passivation process became the solution to this problem. He discovered that when a thin layer of silicon dioxide was grown on the surface of silicon where a p–n junction intercepts the surface, the leakage current of the junction was reduced by a factor from 10 to 100. This showed that the oxide reduces and stabilizes many of the interface and oxide traps. Oxide-passivation of silicon surfaces allowed diodes and transistors to be fabricated with significantly improved device characteristics, while the leakage path along the surface of the silicon was also effectively shut off. This became one of the fundamental isolation capabilities necessary for planar technology and integrated circuit chips.[21]

Atalla first published his findings in BTL memos during 1957, before presenting his work at an Electrochemical Society meeting in 1958.[22][23] The same year, he made further refinements to the process with his colleagues E. Tannenbaum and E.J. Scheibner, before they published their results in May 1959.[24][25] According to Fairchild Semiconductor engineer Chih-Tang Sah, the surface passivation process developed by Atalla's team "blazed the trail" that led to the development of the silicon integrated circuit.[21][24] Atalla's surface passivation method was the basis for several important inventions in 1959: the MOSFET (MOS transistor) by Atalla and Dawon Kahng at Bell Labs, the planar process by Jean Hoerni at Fairchild Semiconductor, and the monolithic integrated circuit chip by Robert Noyce at Fairchild in 1959.[22][23][21][24] By the mid-1960s, Atalla's process for oxidized silicon surfaces was used to fabricate virtually all integrated circuits and silicon devices.[26]

In solar cell technology, surface passivation is critical to solar cell efficiency.[27] In carbon quantum dot (CQD) technology, CQDs are small carbon nanoparticles (less than 10 nm in size) with some form of surface passivation.[28][29][30]

مواد معينة

الألومنيوم

Aluminium naturally forms a thin surface layer of aluminium oxide on contact with oxygen in the atmosphere through a process called oxidation, which creates a physical barrier to corrosion or further oxidation in many environments. Some aluminium alloys, however, do not form the oxide layer well, and thus are not protected against corrosion. There are methods to enhance the formation of the oxide layer for certain alloys. For example, prior to storing hydrogen peroxide in an aluminium container, the container can be passivated by rinsing it with a dilute solution of nitric acid and peroxide alternating with deionized water. The nitric acid and peroxide mixture oxidizes and dissolves any impurities on the inner surface of the container, and the deionized water rinses away the acid and oxidized impurities.[31]

Generally, there are two main ways to passivate aluminium alloys (not counting plating, painting, and other barrier coatings): chromate conversion coating and anodizing. Alclading, which metallurgically bonds thin layers of pure aluminium or alloy to different base aluminium alloy, is not strictly passivation of the base alloy. However, the aluminium layer clad on is designed to spontaneously develop the oxide layer and thus protect the base alloy.

Chromate conversion coating converts the surface aluminium to an aluminium chromate coating in the range of 0.00001–0.00004 inches (250–1,000 nm) in thickness. Aluminium chromate conversion coatings are amorphous in structure with a gel-like composition hydrated with water.[32] Chromate conversion is a common way of passivating not only aluminium, but also zinc, cadmium, copper, silver, magnesium, and tin alloys.

Anodizing is an electrolytic process that forms a thicker oxide layer. The anodic coating consists of hydrated aluminium oxide and is considered resistant to corrosion and abrasion.[33] This finish is more robust than the other processes and also provides electrical insulation, which the other two processes may not.

الكربون

In carbon quantum dot (CQD) technology, CQDs are small carbon nanoparticles (less than 10 nm in size) with some form of surface passivation.[28][34][35]

المواد الحديدية

Tempering colors are produced when steel is heated and a thin film of iron oxide forms on the surface. The color indicates the temperature the steel reached, which made this one of the earliest practical uses of thin-film interference.

Ferrous materials, including steel, may be somewhat protected by promoting oxidation ("rust") and then converting the oxidation to a metalophosphate by using phosphoric acid and further protected by surface coating. As the uncoated surface is water-soluble, a preferred method is to form manganese or zinc compounds by a process commonly known as parkerizing or phosphate conversion. Older, less-effective but chemically-similar electrochemical conversion coatings included black oxidizing, historically known as bluing or browning. Ordinary steel forms a passivating layer in alkali environments, as reinforcing bar does in concrete.

الصلب الذي لا يصدأ

The fitting on the left has not been passivated, the fitting on the right has been passivated.

Stainless steels are corrosion-resistant, but they are not completely impervious to rusting. One common mode of corrosion in corrosion-resistant steels is when small spots on the surface begin to rust because grain boundaries or embedded bits of foreign matter (such as grinding swarf) allow water molecules to oxidize some of the iron in those spots despite the alloying chromium. This is called rouging. Some grades of stainless steel are especially resistant to rouging; parts made from them may therefore forgo any passivation step, depending on engineering decisions.[36]

Common among all of the different specifications and types are the following steps: Prior to passivation, the object must be cleaned of any contaminants and generally must undergo a validating test to prove that the surface is 'clean.' The object is then placed in an acidic passivating bath that meets the temperature and chemical requirements of the method and type specified between customer and vendor. While nitric acid is commonly used as a passivating acid for stainless steel, citric acid is gaining in popularity as it is far less dangerous to handle, less toxic, and biodegradable, making disposal less of a challenge. Passivating temperatures can range from ambient to 60 °C, or 140 °F (60 °C), while minimum passivation times are usually 20 to 30 minutes. After passivation, the parts are neutralized using a bath of aqueous sodium hydroxide, then rinsed with clean water and dried. The passive surface is validated using humidity, elevated temperature, a rusting agent (salt spray), or some combination of the three.[37] The passivation process removes exogenous iron,[38] creates/restores a passive oxide layer that prevents further oxidation (rust), and cleans the parts of dirt, scale, or other welding-generated compounds (e.g. oxides).[38][39]

Passivation processes are generally controlled by industry standards, the most prevalent among them today being ASTM A 967 and AMS 2700. These industry standards generally list several passivation processes that can be used, with the choice of specific method left to the customer and vendor. The "method" is either a nitric acid-based passivating bath, or a citric acid-based bath, these acids remove surface iron and rust, while sparing the chromium. The various 'types' listed under each method refer to differences in acid bath temperature and concentration. Sodium dichromate is often required as an additive to oxidise the chromium in certain 'types' of nitric-based acid baths, however this chemical is highly toxic. With citric acid, simply rinsing and drying the part and allowing the air to oxidise it, or in some cases the application of other chemicals, is used to perform the passivation of the surface.

It is not uncommon for some aerospace manufacturers to have additional guidelines and regulations when passivating their products that exceed the national standard. Often, these requirements will be cascaded down using Nadcap or some other accreditation system. Various testing methods are available to determine the passivation (or passive state) of stainless steel. The most common methods for validating the passivity of a part is some combination of high humidity and heat for a period of time, intended to induce rusting. Electro-chemical testers can also be utilized to commercially verify passivation.


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التيتانيوم

Relation between voltage and color for anodized titanium.

The surface of titanium and of titanium-rich alloys oxidizes immediately upon exposure to air to form a thin passivation layer of titanium oxide, mostly titanium dioxide.[40] This layer makes it resistant to further corrosion, aside from gradual growth of the oxide layer, thickening to ~25 nm after several years in air. This protective layer makes it suitable for use even in corrosive environments such as sea water. Titanium can be anodized to produce a thicker passivation layer. As with many other metals, this layer causes thin-film interference which makes the metal surface appear colored, with the thickness of the passivation layer directly effecting the color produced.

النيكل

Nickel can be used for handling elemental fluorine, owing to the formation of a passivation layer of nickel fluoride. This fact is useful in water treatment and sewage treatment applications.

السليكون

In the area of microelectronics and photovoltaics surface passivation is usually implemented by oxidation to a coating of silicon dioxide. The effect of passivation on the efficiency of solar cells ranges from 3-7%. Passivation is effected by thermal oxidation at 1000 °C. The surface resistivity is high, >100 Ωcm.[41]

انظر أيضاً

المصادر

الهامش

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  2. ^ IUPAC Goldbook
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  4. ^ Bockris & Reddy 1977, p. 1325
  5. ^ Fehlner, Francis P (1986). Low-Temperature Oxidation: The Role of Vitreous Oxides, A Wiley-Interscience Publication. New York: John Wiley & Sons. ISBN 0471-87448-5.
  6. ^ University of Bath & Western Oregon University
  7. ^ Fehlner, Francis P, ref.3.
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ببليوگرافيا

  • Budinski, Kenneth G. (1988), written at Englewood Cliffs, New Jersey, Surface Engineering for Wear Resistance, Prentice Hall.
  • Brimi, Marjorie A. (1965), written at New York, New York, Electrofinishing, American Elsevier Publishing Company, Inc.

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